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Oji Holdings presents wood-based biomass photoresist results at SPIE Photomask Technology + EUV Lithography 2026

PUBT·09/04/2026 02:04:32
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Oji Holdings presents wood-based biomass photoresist results at SPIE Photomask Technology + EUV Lithography 2026
  • Oji Holdings will present its wood-based biomass photoresist results at SPIE Photomask Technology + EUV Lithography 2026 on Sept. 8-11, 2026.
  • High-NA EUV evaluation showed 10 nm line patterns, 16 nm hole patterns, supporting potential use in A14-generation chip processes.


Disclaimer: This news brief was created by Public Technologies (PUBT) using generative artificial intelligence. While PUBT strives to provide accurate and timely information, this AI-generated content is for informational purposes only and should not be interpreted as financial, investment, or legal advice. Oji Holdings Corporation published the original content used to generate this news brief on September 04, 2026, and is solely responsible for the information contained therein.