The 26th China International Industry Fair is being held at the National Convention and Exhibition Center. More than 100 Shanghai science and innovation achievements will be showcased at the Innovation and Technology Museum. In front of Landau Flint's booth, an extreme ultraviolet light source system prototype debuted at the industrial fair. This is also the most advanced domestically produced EUV light source prototype currently on public display. It is also known as the “heart” of a high-end lithography machine. Extreme ultraviolet light sources are one of the three core components of advanced chip manufacturing at 7 nm and below. They have long been restricted by overseas technology monopolies and embargoes, and are a key link limiting the autonomy and control of China's high-end chips. The on-site staff explained that the localization rate of the light source system exhibited this time reached 90%. The vast majority of the core components were developed independently. The technical route is consistent with leading international manufacturers, and can be used for chip exposure testing. Although it is currently still 3-5 years until mass production, this breakthrough has taken a key step in moving domestic EUV light sources from laboratories to industrialization.

The 26th China International Industry Fair is being held at the National Convention and Exhibition Center. More than 100 Shanghai science and innovation achievements will be showcased at the Innovation and Technology Museum. In front of Landau Flint's booth, an extreme ultraviolet light source system prototype debuted at the industrial fair. This is also the most advanced domestically produced EUV light source prototype currently on public display. It is also known as the “heart” of a high-end lithography machine. Extreme ultraviolet light sources are one of the three core components of advanced chip manufacturing at 7 nm and below. They have long been restricted by overseas technology monopolies and embargoes, and are a key link limiting the autonomy and control of China's high-end chips. The on-site staff explained that the localization rate of the light source system exhibited this time reached 90%. The vast majority of the core components were developed independently. The technical route is consistent with leading international manufacturers, and can be used for chip exposure testing. Although it is currently still 3-5 years until mass production, this breakthrough has taken a key step in moving domestic EUV light sources from laboratories to industrialization.