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Semiconductor equipment is a “stuck neck” that China's semiconductor industry has faced in the medium to long term. What step has domestic semiconductor equipment reached on the path to breakthroughs? At this year's Wanchip exhibition, a number of new products such as domestic semiconductor equipment, materials, and tools were showcased, making it an excellent window to observe the latest developments in the industry. Along with the continuous deepening of autonomy and control, domestic equipment is continuing to break through into the high-end field. At this Wanchip exhibition, China Micro, a leading domestic semiconductor etching equipment company, introduced the two newly released high-end semiconductor microprocessing equipment. Huahai Qingke released medium beam ion injector products, continuing to work towards localization of key equipment; Microguide Nano launched a new Imagtron series magnetron sputtering system and special ALD equipment for RU ultra-thin film processes, achieving full coverage of the three mainstream thin film deposition technology routes of ALD, CVD, and PVD.

Zhitongcaijing·10/15/2026 23:49:02
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Semiconductor equipment is a “stuck neck” that China's semiconductor industry has faced in the medium to long term. What step has domestic semiconductor equipment reached on the path to breakthroughs? At this year's Wanchip exhibition, a number of new products such as domestic semiconductor equipment, materials, and tools were showcased, making it an excellent window to observe the latest developments in the industry. Along with the continuous deepening of autonomy and control, domestic equipment is continuing to break through into the high-end field. At this Wanchip exhibition, China Micro, a leading domestic semiconductor etching equipment company, introduced the two newly released high-end semiconductor microprocessing equipment. Huahai Qingke released medium beam ion injector products, continuing to work towards localization of key equipment; Microguide Nano launched a new Imagtron series magnetron sputtering system and special ALD equipment for RU ultra-thin film processes, achieving full coverage of the three mainstream thin film deposition technology routes of ALD, CVD, and PVD.